Abstract: Despite the use of mask defect avoidance and mitigation techniques, finding a usable defective mask blank remains a challenge for Extreme Ultraviolet Lithography (EUVL) at sub-10nm node due ...
Abstract: This paper reports a novel DRIE compensation mask pattern for fabricating an extremely thick sense-comb structure. When we attempted to fabricate a 300-μm-thick sense-comb structure to ...
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DIY no sew face mask upgrades! (so they won't hurt!)
Hey guys! After my last video I got lots of questions. I didn't expect to be making another mask video, but I wanted to address issues of comfort and share some hacks that have really helped me, and I ...
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